X-ray photoelectron spectroscopic study of magnetron sputtered carbon-nickel composite films

Gy J. Kovács, I. Bertóti, G. Radnóczi

Research output: Article

59 Citations (Scopus)

Abstract

Carbon-nickel films were deposited by direct current magnetron sputtering in argon plasma at temperatures between 25 and 800 °C. The films have a composite structure, consisting of a nanocrystalline dispersed phase embedded in an amorphous carbon matrix as revealed by high resolution transmission electron microscopy. Based on selected area electron diffraction, the crystalline phase was assigned to hexagonal nickel carbide (Ni3C) for films grown below 400 °C and to face centered cubic nickel for those prepared above 400 °C. X-ray photoelectron spectroscopic studies verify these results. In films deposited below 400 °C the carbon 1s spectral range contains two low binding energy components at 283.2 and at 281.5 eV (± 0.2 eV). While the peak at 281.5 eV corresponds to the carbidic environment, the component at 283.2 eV, existing also in high temperature samples, is assigned to carbon atoms constituting the interface between the carbon matrix and the Ni3C or Ni crystallites.

Original languageEnglish
Pages (from-to)7942-7946
Number of pages5
JournalThin Solid Films
Volume516
Issue number21
DOIs
Publication statusPublished - szept. 1 2008

Fingerprint

Composite films
Photoelectrons
Nickel
photoelectrons
Carbon
nickel
X rays
composite materials
carbon
x rays
Argon
Amorphous carbon
High resolution transmission electron microscopy
Composite structures
Binding energy
Crystallites
Electron diffraction
Magnetron sputtering
argon plasma
Carbides

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

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title = "X-ray photoelectron spectroscopic study of magnetron sputtered carbon-nickel composite films",
abstract = "Carbon-nickel films were deposited by direct current magnetron sputtering in argon plasma at temperatures between 25 and 800 °C. The films have a composite structure, consisting of a nanocrystalline dispersed phase embedded in an amorphous carbon matrix as revealed by high resolution transmission electron microscopy. Based on selected area electron diffraction, the crystalline phase was assigned to hexagonal nickel carbide (Ni3C) for films grown below 400 °C and to face centered cubic nickel for those prepared above 400 °C. X-ray photoelectron spectroscopic studies verify these results. In films deposited below 400 °C the carbon 1s spectral range contains two low binding energy components at 283.2 and at 281.5 eV (± 0.2 eV). While the peak at 281.5 eV corresponds to the carbidic environment, the component at 283.2 eV, existing also in high temperature samples, is assigned to carbon atoms constituting the interface between the carbon matrix and the Ni3C or Ni crystallites.",
keywords = "Carbon-metal composite, Carbon-nickel composite film, Transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS)",
author = "Kov{\'a}cs, {Gy J.} and I. Bert{\'o}ti and G. Radn{\'o}czi",
year = "2008",
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T1 - X-ray photoelectron spectroscopic study of magnetron sputtered carbon-nickel composite films

AU - Kovács, Gy J.

AU - Bertóti, I.

AU - Radnóczi, G.

PY - 2008/9/1

Y1 - 2008/9/1

N2 - Carbon-nickel films were deposited by direct current magnetron sputtering in argon plasma at temperatures between 25 and 800 °C. The films have a composite structure, consisting of a nanocrystalline dispersed phase embedded in an amorphous carbon matrix as revealed by high resolution transmission electron microscopy. Based on selected area electron diffraction, the crystalline phase was assigned to hexagonal nickel carbide (Ni3C) for films grown below 400 °C and to face centered cubic nickel for those prepared above 400 °C. X-ray photoelectron spectroscopic studies verify these results. In films deposited below 400 °C the carbon 1s spectral range contains two low binding energy components at 283.2 and at 281.5 eV (± 0.2 eV). While the peak at 281.5 eV corresponds to the carbidic environment, the component at 283.2 eV, existing also in high temperature samples, is assigned to carbon atoms constituting the interface between the carbon matrix and the Ni3C or Ni crystallites.

AB - Carbon-nickel films were deposited by direct current magnetron sputtering in argon plasma at temperatures between 25 and 800 °C. The films have a composite structure, consisting of a nanocrystalline dispersed phase embedded in an amorphous carbon matrix as revealed by high resolution transmission electron microscopy. Based on selected area electron diffraction, the crystalline phase was assigned to hexagonal nickel carbide (Ni3C) for films grown below 400 °C and to face centered cubic nickel for those prepared above 400 °C. X-ray photoelectron spectroscopic studies verify these results. In films deposited below 400 °C the carbon 1s spectral range contains two low binding energy components at 283.2 and at 281.5 eV (± 0.2 eV). While the peak at 281.5 eV corresponds to the carbidic environment, the component at 283.2 eV, existing also in high temperature samples, is assigned to carbon atoms constituting the interface between the carbon matrix and the Ni3C or Ni crystallites.

KW - Carbon-metal composite

KW - Carbon-nickel composite film

KW - Transmission electron microscopy (TEM)

KW - X-ray photoelectron spectroscopy (XPS)

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JF - Thin Solid Films

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