Ultrafast laser plasma assisted rare-earth doping for silicon photonics

Gin Jose, Jayakrishnan Chandrappan, Suraya Ahmad Kamil, Matthew Murray, Z. Zolnai, Emil Agocs, Peter Petrik, Paul Steenson, Thomas Krauss

Research output: Conference contribution

Abstract

A novel technique for rare-earth doping in silica is developed with femtosecond laser plasma processing and record high concentration of erbium in silica/silica-on-silicon platforms to realize compact optical amplifiers for silicon photonics are achieved.

Original languageEnglish
Title of host publication2016 Conference on Lasers and Electro-Optics, CLEO 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580118
DOIs
Publication statusPublished - dec. 16 2016
Event2016 Conference on Lasers and Electro-Optics, CLEO 2016 - San Jose, United States
Duration: jún. 5 2016jún. 10 2016

Publication series

Name2016 Conference on Lasers and Electro-Optics, CLEO 2016

Other

Other2016 Conference on Lasers and Electro-Optics, CLEO 2016
CountryUnited States
CitySan Jose
Period6/5/166/10/16

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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  • Cite this

    Jose, G., Chandrappan, J., Kamil, S. A., Murray, M., Zolnai, Z., Agocs, E., Petrik, P., Steenson, P., & Krauss, T. (2016). Ultrafast laser plasma assisted rare-earth doping for silicon photonics. In 2016 Conference on Lasers and Electro-Optics, CLEO 2016 [7787390] (2016 Conference on Lasers and Electro-Optics, CLEO 2016). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1364/cleo_at.2016.atu3k.5