Titanium implantation in bulk and thin film amorphous silica

Stéphane Tisserand, François Flory, Alexandre Gatto, Laurent Roux, Miklos Adamik, Istvan Kovacs

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15 Citations (Scopus)

Abstract

Both bulk and thin film amorphous silica implanted with titanium were investigated. We studied the induced modifications of the microstructure and the consequences on the optical properties. We determined the refractive index profile of implanted materials from guided wave measurements and we show that it matches the distribution of titanium. An increase in refractive index of up to 0.9 can be obtained by high dose implantation. A study of thermal annealing in air shows that the implanted materials exhibit low optical losses.

Original languageEnglish
Pages (from-to)5150-5153
Number of pages4
JournalJournal of Applied Physics
Volume83
Issue number10
DOIs
Publication statusPublished - máj. 15 1998

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Tisserand, S., Flory, F., Gatto, A., Roux, L., Adamik, M., & Kovacs, I. (1998). Titanium implantation in bulk and thin film amorphous silica. Journal of Applied Physics, 83(10), 5150-5153. https://doi.org/10.1063/1.367332