The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

Z. Donkó, J. Schulze, P. Hartmann, I. Korolov, U. Czarnetzki, E. Schüngel

Research output: Article

57 Citations (Scopus)

Abstract

Dual-frequency capacitive discharges are used to separately control the mean ion energy, ε- ion, and F flux, ion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ≈0, ion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. ε- ion increases with γ, which might allow an in situ determination of γ -coefficients.

Original languageEnglish
Article number081501
JournalApplied Physics Letters
Volume97
Issue number8
DOIs
Publication statusPublished - aug. 23 2010

Fingerprint

radio frequency discharge
ions
electrons
energy
multiplication
sheaths
argon
low frequencies
electrodes
electric potential
coefficients
cells
simulation

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

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T1 - The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

AU - Donkó, Z.

AU - Schulze, J.

AU - Hartmann, P.

AU - Korolov, I.

AU - Czarnetzki, U.

AU - Schüngel, E.

PY - 2010/8/23

Y1 - 2010/8/23

N2 - Dual-frequency capacitive discharges are used to separately control the mean ion energy, ε- ion, and F flux, ion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ≈0, ion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. ε- ion increases with γ, which might allow an in situ determination of γ -coefficients.

AB - Dual-frequency capacitive discharges are used to separately control the mean ion energy, ε- ion, and F flux, ion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ≈0, ion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. ε- ion increases with γ, which might allow an in situ determination of γ -coefficients.

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