Texture evolution in stratified AI thin films

M. Adamik, I. Tomov, P. Barna

Research output: Article

3 Citations (Scopus)

Abstract

The texture evolution of Al thin films stratified by thin Ti and SiO2 interlayers was investigated by cross sectional transmission electron microscopy and x-ray diffractometer measurements. The individual films between the Ti layers grow according to zone II by grain growth, while the structure of the film as a whole is formed by competitive growth. The texture evolution in the Al films stratified by the Ti interlayers is enhanced due to oriented nucleation of Al on the Ti film. In case of stratification by amorphous SiO2 films the texture sharpness corresponds to the texture of the individual Al sublayers. The investigations indicate that stratification can be an appropriate tool for texture control.

Original languageEnglish
Pages (from-to)213-218
Number of pages6
JournalSolid State Phenomena
Volume56
Publication statusPublished - 1997

Fingerprint

textures
Textures
Thin films
thin films
stratification
interlayers
sharpness
Diffractometers
Amorphous films
diffractometers
Grain growth
Nucleation
nucleation
Transmission electron microscopy
X rays
transmission electron microscopy
x rays

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Texture evolution in stratified AI thin films. / Adamik, M.; Tomov, I.; Barna, P.

In: Solid State Phenomena, Vol. 56, 1997, p. 213-218.

Research output: Article

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