Role of underlayers in the development of evolutionary texture in polycrystalline thin films

Research output: Article

5 Citations (Scopus)

Abstract

The evolution of texture in polycrystalline thin films is mainly controlled by two parameters: the substrate temperature and the impurity content. Experiments carried out on Al thin films, deposited with different deposition rates onto Cr and amorphous Al2O3 underlayers, indicate that the substrate used has an influence on the incorporation of impurities into the film. The incorporated impurities are segregated into the grain boundaries and limit the grain boundary migration, in this way limiting the texture evolution.

Original languageEnglish
Pages (from-to)109-112
Number of pages4
JournalSurface and Coatings Technology
Volume80
Issue number1-2
DOIs
Publication statusPublished - márc. 1996

Fingerprint

textures
Textures
Impurities
Thin films
impurities
Grain boundaries
thin films
grain boundaries
Substrates
Deposition rates
Experiments
Temperature
temperature

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

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title = "Role of underlayers in the development of evolutionary texture in polycrystalline thin films",
abstract = "The evolution of texture in polycrystalline thin films is mainly controlled by two parameters: the substrate temperature and the impurity content. Experiments carried out on Al thin films, deposited with different deposition rates onto Cr and amorphous Al2O3 underlayers, indicate that the substrate used has an influence on the incorporation of impurities into the film. The incorporated impurities are segregated into the grain boundaries and limit the grain boundary migration, in this way limiting the texture evolution.",
keywords = "Impurities, Texture, Thin films, Underlayer",
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AU - Barna, P.

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AB - The evolution of texture in polycrystalline thin films is mainly controlled by two parameters: the substrate temperature and the impurity content. Experiments carried out on Al thin films, deposited with different deposition rates onto Cr and amorphous Al2O3 underlayers, indicate that the substrate used has an influence on the incorporation of impurities into the film. The incorporated impurities are segregated into the grain boundaries and limit the grain boundary migration, in this way limiting the texture evolution.

KW - Impurities

KW - Texture

KW - Thin films

KW - Underlayer

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