Pyrolytic laser-induced chemical vapor deposition (LCVD) of microstructures

T. Szörényi, K. Piglmayer, D. Bäuerle

Research output: Article

Abstract

An analysis of the time evolution of the growth of W spots deposited by hydrogen reduction of WF6 under 647.1 nm Kr ion laser irradiation is presented. From measured lateral growth rates of the spots and model calculations for the temperature distributions in the deposit/substrate system the chemical kinetics that controls the deposition process is determined. The apparent chemical activation energies derived for substrates of fused quartz covered either with 70 nm of sputtered W or with 120 nm of amorphous Si (a-Si) are 30 kcal//mol and 40 kcal/mol, respectively.

Original languageEnglish
Pages (from-to)319-325
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1033
DOIs
Publication statusPublished - máj. 18 1989

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ASJC Scopus subject areas

  • Applied Mathematics
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Computer Science Applications

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