Phase formation sequence in the Ti/InP system during thin film solid-state reactions

E. Ghegin, Ph Rodriguez, J. L. Lábár, M. Menyhárd, S. Favier, I. Sagnes, F. Nemouchi

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Abstract

The metallurgical properties of the Ti/InP system meet a great interest for its use as a contact in the scope of various applications such as the Si Photonics. The investigations conducted on this system highlight the initiation of a reaction between the Ti and the InP substrate during the deposition process conducted at 100 °C. The simultaneous formation of two binary phases, namely, Ti2In5 and TiP, is attributed to the compositional gradient induced in the InP by the wet surface preparation and enhanced by the subsequent in situ Ar+ preclean. Once formed, the TiP layer acts as a diffusion barrier inhibiting further reaction up to 450 °C in spite of the presence of an important Ti reservoir. At higher temperature, however, i.e., from 550 °C, the reaction is enabled either by the enhancement of the species diffusion through the TiP layer or by its agglomeration. This reaction gives rise to the total consumption of the Ti2In5 and Ti while the TiP and In phases are promoted.

Original languageEnglish
Article number245311
JournalJournal of Applied Physics
Volume121
Issue number24
DOIs
Publication statusPublished - jún. 28 2017

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Ghegin, E., Rodriguez, P., Lábár, J. L., Menyhárd, M., Favier, S., Sagnes, I., & Nemouchi, F. (2017). Phase formation sequence in the Ti/InP system during thin film solid-state reactions. Journal of Applied Physics, 121(24), [245311]. https://doi.org/10.1063/1.4990427