Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM

O. Geszti, G. Radnóczi, I. Bertóti, T. Szörényi, F. Antoni, E. Fogarassy

Research output: Article

9 Citations (Scopus)

Abstract

Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1-100Pa N2 pressure and 1-10 Jcm-2 fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films, the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N2, to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N2. Ablation with pulses of high fluence (10 J cm-2) results in more compact films. The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters.

Original languageEnglish
Pages (from-to)502-506
Number of pages5
JournalApplied Surface Science
Volume186
Issue number1-4
DOIs
Publication statusPublished - jan. 28 2002

Fingerprint

carbon nitrides
Carbon nitride
Excimer lasers
excimer lasers
Electron microscopes
electron microscopes
Chemical analysis
fluence
Nitrogen
nitrogen
Graphite
void ratio
Silicon
Laser ablation
Ablation
floating
x ray spectroscopy
laser ablation
ablation
cyanogen

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

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abstract = "Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1-100Pa N2 pressure and 1-10 Jcm-2 fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films, the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N2, to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N2. Ablation with pulses of high fluence (10 J cm-2) results in more compact films. The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters.",
keywords = "Ablation, Carbon nitride, Microstructure, PLD, Thin films",
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T1 - Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM

AU - Geszti, O.

AU - Radnóczi, G.

AU - Bertóti, I.

AU - Szörényi, T.

AU - Antoni, F.

AU - Fogarassy, E.

PY - 2002/1/28

Y1 - 2002/1/28

N2 - Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1-100Pa N2 pressure and 1-10 Jcm-2 fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films, the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N2, to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N2. Ablation with pulses of high fluence (10 J cm-2) results in more compact films. The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters.

AB - Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1-100Pa N2 pressure and 1-10 Jcm-2 fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films, the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N2, to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N2. Ablation with pulses of high fluence (10 J cm-2) results in more compact films. The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters.

KW - Ablation

KW - Carbon nitride

KW - Microstructure

KW - PLD

KW - Thin films

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EP - 506

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

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ER -