Lateral growth rates in laser CVD of tungsten microstructures

T. Szörényi, K. Piglmayer, G. Q. Zhang, D. Bäuerle

Research output: Article

10 Citations (Scopus)

Abstract

The lateral growth rates observed during the Kr+ laser-induced deposition of W spots from gaseous mixtures of WF6 and H2 have been analyzed on the basis of model calculations for pyrolytic laser-CVD. The apparent chemical activation energies derived for substrates of fused quartz (a-SiO2) covered either with 700 Å of sputtered W or with 1200 Å of amorphous Si (a-Si) are 30 and 40 kcal/mol, respectively.

Original languageEnglish
Pages (from-to)442-456
Number of pages15
JournalSurface Science
Volume202
Issue number3
DOIs
Publication statusPublished - aug. 2 1988

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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