Determination of grain-boundary diffusion coefficients by Auger electron spectroscopy

Z. Erdélyi, Ch Girardeaux, G. Langer, L. Daróczi, A. Rolland, D. Beke

Research output: Article

17 Citations (Scopus)

Abstract

Surface accumulation method, called the Hwang-Balluffi method, was applied to measure the grain-boundary diffusion of Ag at low temperatures (413 and 428 K) in a nanocrystalline Cu film. Ag atoms from the Ag layer diffused through the copper nanocrystalline film along the grain boundaries to the opposite surface (i.e. the accumulation surface) where they spread out by rapid surface diffusion and accumulated. The rate of accumulation was detected by Auger Electron Spectroscopy (AES). It was shown that the results are not sensitive to the supposition whether accumulation takes place in one or two monolayers of the surface. TEM observations have been made in the same time before and after heat treatment to check the stability of the nanostructure.

Original languageEnglish
Pages (from-to)213-218
Number of pages6
JournalApplied Surface Science
Volume162
DOIs
Publication statusPublished - aug. 1 2000

Fingerprint

Auger electron spectroscopy
Auger spectroscopy
electron spectroscopy
Grain boundaries
diffusion coefficient
grain boundaries
Surface diffusion
surface diffusion
Copper
Monolayers
Nanostructures
heat treatment
Heat treatment
Transmission electron microscopy
copper
Atoms
transmission electron microscopy
atoms
Temperature

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

@article{3cbee3332b2c406dbc4e1c492f41a20c,
title = "Determination of grain-boundary diffusion coefficients by Auger electron spectroscopy",
abstract = "Surface accumulation method, called the Hwang-Balluffi method, was applied to measure the grain-boundary diffusion of Ag at low temperatures (413 and 428 K) in a nanocrystalline Cu film. Ag atoms from the Ag layer diffused through the copper nanocrystalline film along the grain boundaries to the opposite surface (i.e. the accumulation surface) where they spread out by rapid surface diffusion and accumulated. The rate of accumulation was detected by Auger Electron Spectroscopy (AES). It was shown that the results are not sensitive to the supposition whether accumulation takes place in one or two monolayers of the surface. TEM observations have been made in the same time before and after heat treatment to check the stability of the nanostructure.",
author = "Z. Erd{\'e}lyi and Ch Girardeaux and G. Langer and L. Dar{\'o}czi and A. Rolland and D. Beke",
year = "2000",
month = "8",
day = "1",
doi = "10.1016/S0169-4332(00)00194-X",
language = "English",
volume = "162",
pages = "213--218",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

TY - JOUR

T1 - Determination of grain-boundary diffusion coefficients by Auger electron spectroscopy

AU - Erdélyi, Z.

AU - Girardeaux, Ch

AU - Langer, G.

AU - Daróczi, L.

AU - Rolland, A.

AU - Beke, D.

PY - 2000/8/1

Y1 - 2000/8/1

N2 - Surface accumulation method, called the Hwang-Balluffi method, was applied to measure the grain-boundary diffusion of Ag at low temperatures (413 and 428 K) in a nanocrystalline Cu film. Ag atoms from the Ag layer diffused through the copper nanocrystalline film along the grain boundaries to the opposite surface (i.e. the accumulation surface) where they spread out by rapid surface diffusion and accumulated. The rate of accumulation was detected by Auger Electron Spectroscopy (AES). It was shown that the results are not sensitive to the supposition whether accumulation takes place in one or two monolayers of the surface. TEM observations have been made in the same time before and after heat treatment to check the stability of the nanostructure.

AB - Surface accumulation method, called the Hwang-Balluffi method, was applied to measure the grain-boundary diffusion of Ag at low temperatures (413 and 428 K) in a nanocrystalline Cu film. Ag atoms from the Ag layer diffused through the copper nanocrystalline film along the grain boundaries to the opposite surface (i.e. the accumulation surface) where they spread out by rapid surface diffusion and accumulated. The rate of accumulation was detected by Auger Electron Spectroscopy (AES). It was shown that the results are not sensitive to the supposition whether accumulation takes place in one or two monolayers of the surface. TEM observations have been made in the same time before and after heat treatment to check the stability of the nanostructure.

UR - http://www.scopus.com/inward/record.url?scp=0343006794&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0343006794&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(00)00194-X

DO - 10.1016/S0169-4332(00)00194-X

M3 - Article

AN - SCOPUS:0343006794

VL - 162

SP - 213

EP - 218

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -