Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies

T. Szörényi, C. Fuchs, E. Fogarassy, J. Hommet, F. Le Normand

Research output: Article

60 Citations (Scopus)


Amorphous carbon nitride films are deposited at room temperature on silicon substrates by ArF excimer laser (193nm) ablation of a graphite target in nitrogen atmosphere. By tuning the process parameters, fine control of the carbon-carbon and carbon-nitrogen bond configuration is achieved in a broad range as followed by X-ray photoelectron spectroscopy (XPS) and infrared (IR) absorption spectroscopy. Based on the comparative and quantitative analysis of changes in measured IR versus XPS spectra as a function of reactive gas pressure, laser fluence and target-to-substrate distance, and on a critical review of the existing interpretation of IR data, an assignment of the components of the broad band extending from 900 to 1900cm-1 in the IR spectra to specific carbon-carbon and carbon-nitrogen bond configurations is proposed.

Original languageEnglish
Pages (from-to)308-312
Number of pages5
JournalSurface and Coatings Technology
Issue number1-3
Publication statusPublished - márc. 2000


ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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