CCl 4 decomposition in rf thermal plasma in inert and oxidative environments

Research output: Article

2 Citations (Scopus)


The decomposition of carbon tetrachloride was investigated in an RF induc tively coupled thermal plasma reactor in inert CCl 4-Ar and in oxidative CCl 4-O 2-Ar systems, respectively. The exhaust gases were analyzed by gas chromatography-mass spectrometry. The kinetics of CCl 4 decomposition at the experimental conditions was modeled in the temperature range of 300-7,000 K. The simulations predicted 67.0 and 97.9% net conversions of CCl 4 for CCl 4-Ar and for CCl 4-O 2-Ar, respectively. These values are close to the experimentally determined values of 60.6 and 92.5%. We concluded that in RF thermal plasma much less CCl 4 reconstructed in oxidative environment than in an oxygen-free mixture.

Original languageEnglish
Pages (from-to)281-286
Number of pages6
JournalPlasma Chemistry and Plasma Processing
Issue number2
Publication statusPublished - ápr. 1 2010

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'CCl <sub>4</sub> decomposition in rf thermal plasma in inert and oxidative environments'. Together they form a unique fingerprint.

  • Cite this