Atypical characteristics of KrF excimer laser ablation of indium-tin oxide films

T. Szörényi, Z. Kántor, L. D. Laude

Research output: Article

36 Citations (Scopus)


Indium-tin oxide films possess ablation characteristics which are a function of the film thickness. For 70 and 160 nm thicknesses, low-fluence single pulses are sufficient to remove from the support the solid phase oxide film over the whole illuminated area. Processing under such conditions offers a rather convenient means for large-area "clean" surface patterning, which is, however, limited at high fluences by the onset of melting. At fluences higher than this onset, layer-by-layer ablation via evaporation sets in. For thicker films, only ablation via evaporation is possible. These experimental findings are interpreted in the framework of a thermal model which is supported by appropriate numerical calculations of the temperature distribution in these films.

Original languageEnglish
Pages (from-to)219-222
Number of pages4
JournalApplied Surface Science
Issue number1-4
Publication statusPublished - febr. 1995


ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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