Activation of shallow boron acceptor in CB coimplanted silicon carbide: A theoretical study

A. Gali, T. Hornos, P. Deák, N. T. Son, E. Janźn, W. J. Choyke

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Abstract

Ab initio supercell calculations have been carried out to investigate the complexes of boron acceptors with carbon self-interstitials in cubic silicon carbide. Based on the calculated binding energies, the complex formation of carbon interstitials with shallow boron acceptor and boron interstitial is energetically favored in silicon carbide. These bistable boron defects possess deep, negative- U occupation levels in the band gap. The theoretical results can explain the observed activation rates in carbon-boron coimplantation experiments.

Original languageEnglish
Article number102108
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number10
DOIs
Publication statusPublished - márc. 7 2005

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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