XRD study of thermal stability of Mo/V crystalline multilayers

M. Kis-Varga, A. Dudás, G. A. Langer, D. L. Beke, Gy Kerekes, L. Daróczi

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Epitaxial Mo/V multilayers with modulation wavelength of ≈ 5-6 nm, and with total film thickness in the 120-150 nm range have been deposited onto polished (001) MgO substrates by magnetron sputtering. The characterisation of the as deposited multilayers and the study of thermal induced changes of superstructures have been performed by X-ray diffraction with CuKα radiation monochromatised by graphite crystal in the diffracted beam. The sharp and intense Bragg-peaks in the low angle region as well as the satellites around the central (002) Mo/V Bragg-peak near 60° indicated the presence of good quality as deposited structures of smooth Mo and V layers. The thermal stability of the films has been studied by annealing in vacuum at 1000-1700 K for various time periods, and by measuring the low and high angle XRD spectra after each step of heat treatment. In addition to the measurement of the thermal induced intensity changes of the low angle Braggpeaks, which are characteristic to the intermixing of the components, the inter- and intralayer structure as well as the quality of interfaces were estimated from simulation and fitting the measured high angle spectra by using the structural refinement program of SUPREX.

Original languageEnglish
Pages (from-to)463-468
Number of pages6
JournalMaterials Science Forum
Volume321-324 I
Publication statusPublished - Dec 1 2000

Keywords

  • Epitaxial Multilayers
  • Kinematical Modelling
  • Structural Degradation
  • Thermal Stability

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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