XPS analysis of nano-thin films on substrate

S. F. Mao, Z. M. Zhang, K. Tokesi, A. Csik, J. Toth, R. J. Bereczky, Z. J. Ding

Research output: Contribution to journalArticle

2 Citations (Scopus)


For a surface localized nano-structure, the XPS quantification based only on peak intensity analysis is inaccurate. In this work, we have developed an algorithm that is more elaborate and convenient for application to XPS quantification of nanoscale thin film on substrate by considering the background in a region of about 100 eV following the film signal peak. A W/SiO2 overlayer sample is investigated in this work. Theoretical evaluation of the spectra is compared with the experimental result and a pertinent algorithm is derived for application to the film thickness analysis.

Original languageEnglish
Pages (from-to)728-730
Number of pages3
JournalSurface and Interface Analysis
Issue number3-4
Publication statusPublished - Mar 1 2008



  • Film thickness
  • Nano-thin film
  • XPS

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Mao, S. F., Zhang, Z. M., Tokesi, K., Csik, A., Toth, J., Bereczky, R. J., & Ding, Z. J. (2008). XPS analysis of nano-thin films on substrate. Surface and Interface Analysis, 40(3-4), 728-730. https://doi.org/10.1002/sia.2800