Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si

H films

A. Nemeth, D. Attygalle, L. R. Dahal, P. Aryal, Z. Huang, C. Salupo, P. Petrik, G. Juhasz, C. Major, O. Polgar, M. Fried, B. Pécz, R. W. Collins

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A prototype expanded-beam spectroscopic ellipsometer has been developed that uses uncollimated (non-parallel, diffuse) illumination with a detection system consisting of an angle-of-incidence-sensitive pinhole camera for high-speed, large-area imaging/mapping applications. The performance of this novel instrument is being tested for imaging/mapping of mixed-phase hydrogenated silicon films having graded amorphous (a-Si:H) and nanocrystalline (nc-Si:H) components throughout the film depth. The speed of the measurement system makes the instrument suitable for use on production lines. The precision enables detection of subnanometer thicknesses, and refractive index and extinction coefficient changes of 0.01. Angle-of-incidence and mirror calibrations are made via well-known sample structures. Alternative commercial instrumentation for mapping by spectroscopic ellipsometry must translate the sample or ellipsometer in two dimensions. For this instrumentation, even a 15 × 15 cm 2 sample with cm 2 resolution requires > 200 measurements and at least 15 min. By imaging along one dimension in parallel, the expanded-beam system can measure with similar resolution in <2 min. The focus of recent instrumentation efforts is on improving the overall system spectral range and its performance.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages267-272
Number of pages6
Volume1321
DOIs
Publication statusPublished - 2012
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 25 2011Apr 29 2011

Other

Other2011 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/25/114/29/11

Fingerprint

ellipsometers
Imaging techniques
Pinhole cameras
Spectroscopic ellipsometry
Silicon
incidence
Refractive index
Mirrors
pinhole cameras
Lighting
Calibration
silicon films
ellipsometry
extinction
illumination
prototypes
high speed
refractivity
mirrors
coefficients

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Nemeth, A., Attygalle, D., Dahal, L. R., Aryal, P., Huang, Z., Salupo, C., ... Collins, R. W. (2012). Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si: H films. In Materials Research Society Symposium Proceedings (Vol. 1321, pp. 267-272) https://doi.org/10.1557/opl.2011.1115

Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si : H films. / Nemeth, A.; Attygalle, D.; Dahal, L. R.; Aryal, P.; Huang, Z.; Salupo, C.; Petrik, P.; Juhasz, G.; Major, C.; Polgar, O.; Fried, M.; Pécz, B.; Collins, R. W.

Materials Research Society Symposium Proceedings. Vol. 1321 2012. p. 267-272.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nemeth, A, Attygalle, D, Dahal, LR, Aryal, P, Huang, Z, Salupo, C, Petrik, P, Juhasz, G, Major, C, Polgar, O, Fried, M, Pécz, B & Collins, RW 2012, Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si: H films. in Materials Research Society Symposium Proceedings. vol. 1321, pp. 267-272, 2011 MRS Spring Meeting, San Francisco, CA, United States, 4/25/11. https://doi.org/10.1557/opl.2011.1115
Nemeth A, Attygalle D, Dahal LR, Aryal P, Huang Z, Salupo C et al. Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si: H films. In Materials Research Society Symposium Proceedings. Vol. 1321. 2012. p. 267-272 https://doi.org/10.1557/opl.2011.1115
Nemeth, A. ; Attygalle, D. ; Dahal, L. R. ; Aryal, P. ; Huang, Z. ; Salupo, C. ; Petrik, P. ; Juhasz, G. ; Major, C. ; Polgar, O. ; Fried, M. ; Pécz, B. ; Collins, R. W. / Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si : H films. Materials Research Society Symposium Proceedings. Vol. 1321 2012. pp. 267-272
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