Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si:H films

A. Nemeth, D. Attygalle, L. R. Dahal, P. Aryal, Z. Huang, C. Salupo, P. Petrik, G. Juhasz, C. Major, O. Polgar, M. Fried, B. Pecz, R. W. Collins

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A prototype expanded-beam spectroscopic ellipsometer has been developed that uses uncollimated (non-parallel, diffuse) illumination with a detection system consisting of an angle-of-incidence-sensitive pinhole camera for high-speed, large-area imaging/mapping applications. The performance of this novel instrument is being tested for imaging/mapping of mixed-phase hydrogenated silicon films having graded amorphous (a-Si:H) and nanocrystalline (nc-Si:H) components throughout the film depth. The speed of the measurement system makes the instrument suitable for use on production lines. The precision enables detection of subnanometer thicknesses, and refractive index and extinction coefficient changes of 0.01. Angle-of-incidence and mirror calibrations are made via well-known sample structures. Alternative commercial instrumentation for mapping by spectroscopic ellipsometry must translate the sample or ellipsometer in two dimensions. For this instrumentation, even a 15 × 15 cm 2 sample with cm 2 resolution requires > 200 measurements and at least 15 min. By imaging along one dimension in parallel, the expanded-beam system can measure with similar resolution in < 2 min. The focus of recent instrumentation efforts is on improving the overall system spectral range and its performance.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011
Pages267-272
Number of pages6
DOIs
Publication statusPublished - Jan 1 2012
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 25 2011Apr 29 2011

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1321
ISSN (Print)0272-9172

Other

Other2011 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/25/114/29/11

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Nemeth, A., Attygalle, D., Dahal, L. R., Aryal, P., Huang, Z., Salupo, C., Petrik, P., Juhasz, G., Major, C., Polgar, O., Fried, M., Pecz, B., & Collins, R. W. (2012). Wide-spectral-range, expanded-beam spectroscopic ellipsometer and its application for imaging/mapping of graded nanocrystalline Si:H films. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011 (pp. 267-272). (Materials Research Society Symposium Proceedings; Vol. 1321). https://doi.org/10.1557/opl.2011.1115