Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method

P. Szabó, F. Riesz, B. Szentpali

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A new method is presented for the measurement of the radii of curvature R of semiconductor wafers using the magic-mirror (Makyoh) technique. A flat mirror is placed beneath the sample, thus a second, 'contour' image of the sample is formed beside the Makyoh image. From the ratio of the two image sizes, R can be determined using a set of reference curved mirrors. Model calculations show good agreement with the results. Other examples of assessing of the flatness of semiconductor samples are presented as well.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages103-108
Number of pages6
Volume379
Publication statusPublished - 1995
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 17 1995Apr 20 1995

Other

OtherProceedings of the 1995 MRS Spring Meeting
CitySan Francisco, CA, USA
Period4/17/954/20/95

Fingerprint

Mirrors
Semiconductor materials

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Szabó, P., Riesz, F., & Szentpali, B. (1995). Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method. In Materials Research Society Symposium - Proceedings (Vol. 379, pp. 103-108). Materials Research Society.

Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method. / Szabó, P.; Riesz, F.; Szentpali, B.

Materials Research Society Symposium - Proceedings. Vol. 379 Materials Research Society, 1995. p. 103-108.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Szabó, P, Riesz, F & Szentpali, B 1995, Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method. in Materials Research Society Symposium - Proceedings. vol. 379, Materials Research Society, pp. 103-108, Proceedings of the 1995 MRS Spring Meeting, San Francisco, CA, USA, 4/17/95.
Szabó P, Riesz F, Szentpali B. Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method. In Materials Research Society Symposium - Proceedings. Vol. 379. Materials Research Society. 1995. p. 103-108
Szabó, P. ; Riesz, F. ; Szentpali, B. / Wafer curvature and flatness measurements using the magic-mirror (Makyoh) method. Materials Research Society Symposium - Proceedings. Vol. 379 Materials Research Society, 1995. pp. 103-108
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