Use of atomic-force microscopy and of a parallel irradiation geometry for in-depth characterization of damage produced by swift Kr ions in silicon

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Abstract

Silicon samples were irradiated with 209 MeV Kr ions in a direction parallel with the (100) plane. The variation vs distance from the irradiated edge, the (010) plane, i.e., vs depth, of the defects produced by the irradiation was evaluated without any sample preparation by atomic-force microscopy (AFM) and spreading resistance measurement on the (100) plane. Both methods indicate a penetration depth of 28 μm, in good agreement with the value given by Monte Carlo (TRIM) range calculation. AFM measurements allowed distinction between four depth zones to which different damage production mechanisms can be ascribed.

Original languageEnglish
Pages (from-to)11853-11856
Number of pages4
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume54
Issue number17
DOIs
Publication statusPublished - 1996

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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