Ultratrace speciation of nitrogen compounds in aerosols collected on silicon wafer surfaces by means of TXRF-NEXAFS

S. Török, J. Osán, B. Beckhoff, G. Ulm

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Total reflection X-ray fluorescence analysis (TXRF) using monochromatized undulator radiation in the PTB radiometry laboratory at the synchrotron radiation facility BESSY II has been employed to investigate the chemical state of nitrogen compounds in aerosols. The aerosol samples of different size fractions were deposited on silicon wafer surfaces in a May impactor. Using a thin window Si(Li) detector, TXRF detection limits for nitrogen are in the upper fg and lower pg range. Taking advantage of the tunability of monochromatized undulator radiation, the near edge X-ray absorption fine structure (NEXAFS) could be combined with TXRF analysis, allowing for the speciation of the aerosols at the nitrogen K absorption edge. Such low detection limits enable an analysis of aerosol samples taken in 10 min with acceptable accuracy. Applicability of the technique to real aerosol samples has been used to compare nitrogen oxidation state in suburban and rural aerosols.

Original languageEnglish
Pages (from-to)81-86
Number of pages6
JournalPowder Diffraction
Volume19
Issue number1
DOIs
Publication statusPublished - Mar 2004

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Nitrogen Compounds
nitrogen compounds
Nitrogen compounds
X ray absorption
Aerosols
Silicon wafers
aerosols
Fluorescence
fine structure
wafers
X rays
fluorescence
silicon
Wigglers
x rays
Nitrogen
nitrogen
Radiation
Radiometry
impactors

ASJC Scopus subject areas

  • Materials Science (miscellaneous)

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Ultratrace speciation of nitrogen compounds in aerosols collected on silicon wafer surfaces by means of TXRF-NEXAFS. / Török, S.; Osán, J.; Beckhoff, B.; Ulm, G.

In: Powder Diffraction, Vol. 19, No. 1, 03.2004, p. 81-86.

Research output: Contribution to journalArticle

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