Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation: From holes to dots

J. A. Sánchez-García, L. Vázquez, R. Gago, A. Redondo-Cubero, J. M. Albella, Z. Czigány

Research output: Contribution to journalArticle

64 Citations (Scopus)

Abstract

We report on the selective production of self-organized nanohole and nanodot patterns on Si(001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar+ ions extracted with a cold cathode ion source. For a fixed ion fluence, nanohole patterns are induced for relatively low ion current densities (50-110 μA cm-2), evolving towards nanodot patterns for current densities above 190 μA cm-2. Both patterns display similar characteristics in terms of wavelength, short-range hexagonal order and roughness. Rutherford backscattering spectrometry measurements show that the surface morphology is tuned by the incorporation of metals coming from the ion source and sample surroundings during the IBS process. The metal content measured in nanohole patterns is almost twice that found in nanodot morphologies. Thus, the pattern morphology results from the balance between the dependences of the erosion rate on the ion flux, the local surface topography and composition. These nanostructures have promising applications as growth templates for preferential growth on either hillocks or cavities.

Original languageEnglish
Article number355306
JournalNanotechnology
Volume19
Issue number35
DOIs
Publication statusPublished - Sep 3 2008

Fingerprint

Ion beams
Surface morphology
Tuning
Metals
Ions
Ion sources
Sputtering
Current density
Rutherford backscattering spectroscopy
Surface topography
Surface structure
Spectrometry
Erosion
Nanostructures
Cathodes
Surface roughness
Fluxes
Wavelength

ASJC Scopus subject areas

  • Materials Science(all)
  • Bioengineering
  • Chemistry(all)
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation : From holes to dots. / Sánchez-García, J. A.; Vázquez, L.; Gago, R.; Redondo-Cubero, A.; Albella, J. M.; Czigány, Z.

In: Nanotechnology, Vol. 19, No. 35, 355306, 03.09.2008.

Research output: Contribution to journalArticle

Sánchez-García, J. A. ; Vázquez, L. ; Gago, R. ; Redondo-Cubero, A. ; Albella, J. M. ; Czigány, Z. / Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation : From holes to dots. In: Nanotechnology. 2008 ; Vol. 19, No. 35.
@article{4babb5c3de2b4ff0a01f364682fc23ff,
title = "Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation: From holes to dots",
abstract = "We report on the selective production of self-organized nanohole and nanodot patterns on Si(001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar+ ions extracted with a cold cathode ion source. For a fixed ion fluence, nanohole patterns are induced for relatively low ion current densities (50-110 μA cm-2), evolving towards nanodot patterns for current densities above 190 μA cm-2. Both patterns display similar characteristics in terms of wavelength, short-range hexagonal order and roughness. Rutherford backscattering spectrometry measurements show that the surface morphology is tuned by the incorporation of metals coming from the ion source and sample surroundings during the IBS process. The metal content measured in nanohole patterns is almost twice that found in nanodot morphologies. Thus, the pattern morphology results from the balance between the dependences of the erosion rate on the ion flux, the local surface topography and composition. These nanostructures have promising applications as growth templates for preferential growth on either hillocks or cavities.",
author = "S{\'a}nchez-Garc{\'i}a, {J. A.} and L. V{\'a}zquez and R. Gago and A. Redondo-Cubero and Albella, {J. M.} and Z. Czig{\'a}ny",
year = "2008",
month = "9",
day = "3",
doi = "10.1088/0957-4484/19/35/355306",
language = "English",
volume = "19",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "35",

}

TY - JOUR

T1 - Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation

T2 - From holes to dots

AU - Sánchez-García, J. A.

AU - Vázquez, L.

AU - Gago, R.

AU - Redondo-Cubero, A.

AU - Albella, J. M.

AU - Czigány, Z.

PY - 2008/9/3

Y1 - 2008/9/3

N2 - We report on the selective production of self-organized nanohole and nanodot patterns on Si(001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar+ ions extracted with a cold cathode ion source. For a fixed ion fluence, nanohole patterns are induced for relatively low ion current densities (50-110 μA cm-2), evolving towards nanodot patterns for current densities above 190 μA cm-2. Both patterns display similar characteristics in terms of wavelength, short-range hexagonal order and roughness. Rutherford backscattering spectrometry measurements show that the surface morphology is tuned by the incorporation of metals coming from the ion source and sample surroundings during the IBS process. The metal content measured in nanohole patterns is almost twice that found in nanodot morphologies. Thus, the pattern morphology results from the balance between the dependences of the erosion rate on the ion flux, the local surface topography and composition. These nanostructures have promising applications as growth templates for preferential growth on either hillocks or cavities.

AB - We report on the selective production of self-organized nanohole and nanodot patterns on Si(001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar+ ions extracted with a cold cathode ion source. For a fixed ion fluence, nanohole patterns are induced for relatively low ion current densities (50-110 μA cm-2), evolving towards nanodot patterns for current densities above 190 μA cm-2. Both patterns display similar characteristics in terms of wavelength, short-range hexagonal order and roughness. Rutherford backscattering spectrometry measurements show that the surface morphology is tuned by the incorporation of metals coming from the ion source and sample surroundings during the IBS process. The metal content measured in nanohole patterns is almost twice that found in nanodot morphologies. Thus, the pattern morphology results from the balance between the dependences of the erosion rate on the ion flux, the local surface topography and composition. These nanostructures have promising applications as growth templates for preferential growth on either hillocks or cavities.

UR - http://www.scopus.com/inward/record.url?scp=48249110346&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=48249110346&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/19/35/355306

DO - 10.1088/0957-4484/19/35/355306

M3 - Article

C2 - 21828846

AN - SCOPUS:48249110346

VL - 19

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 35

M1 - 355306

ER -