Ti nitride phases in thin films deposited by DC magnetron sputtering

Rodica Manaila, Domokos Biro, Peter B. Barna, Miklos Adamik, Florin Zavaliche, Stefan Craciun, Andrei Devenyi

Research output: Contribution to journalArticle

19 Citations (Scopus)


Ti nitride films were deposited by DC magnetron sputtering on HSS and Si substrates. X-ray diffraction showed the formation of single-phase δ-TiN. (111) texture was found in most films, as well as stacking disorder on (111) planes, both correlated with deposition parameters, including the degree of plasma ionization. Evidence was found for plastic deformation relaxing film stress. The structure data are correlated with film microstructure and microhardness.

Original languageEnglish
Pages (from-to)295-302
Number of pages8
JournalApplied Surface Science
Issue number1-4
Publication statusPublished - Oct 2 1995

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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