Thin film homogenization by inverse pulsed laser deposition

Laszlo Egerhazi, Z. Geretovszky, F. Bari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Recently we proposed a novel PLD arrangement, termed inverse pulsed laser deposition (IPLD). Being able to produce thin films of better surface morphology without any complex instrumentation, this method can represent an alternative to the traditional PLD technique while preserving versatility. Two configurations of this new target-substrate arrangement, namely static and co-rotating IPLD were developed. In the static IPLD configuration, the substrate is stationary with respect to the ablated spot; while in the co-rotating IPLD configuration the substrate is fixed to the target surface and rotates simultaneously with the target. Co-rotating IPLD proved to be capable of homogenizing the film thickness. Here we report a model calculation supported by experimental results to describe the radial growth rate variation of co-rotating IPLD films. To characterize the homogeneity of CNx, TiOx, and Ti co-rotating IPLD films, a thickness inhomogeneity index (TII) was introduced, which allows the comparison of thickness homogeneity between films of different lateral dimensions. The presented semi-analytical, semi-numerical model derives the radial variation of the growth rate of co-rotating IPLD films from the lateral growth rate distributions measured along the symmetry axes of the static IPLD films. The laterally averaged growth rate (LAGR) was used to describe how the ambient pressure affects thin film growth in the 0.5-50 Pa domain. As an example, the absolute error between the measured and calculated radial growth rate variation of CNx layers grown by co-rotating IPLD at 5 Pa, was less than 3%, while the LAGR was predicted with 20% accuracy.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume7747
DOIs
Publication statusPublished - 2011
Event16th International School on Quantum Electronics: Laser Physics and Applications - Nessebar, Bulgaria
Duration: Sep 20 2010Sep 24 2010

Other

Other16th International School on Quantum Electronics: Laser Physics and Applications
CountryBulgaria
CityNessebar
Period9/20/109/24/10

Fingerprint

Pulsed Laser Deposition
Pulsed laser deposition
homogenizing
Homogenization
pulsed laser deposition
Thin Films
Thin films
Rotating
thin films
Substrate
Homogeneity
Configuration
Target
homogeneity
Lateral
Arrangement
Substrates
configurations
Surface Morphology
Film growth

Keywords

  • Carbon nitride
  • Inhomogeneity index
  • Inverse pulsed laser deposition
  • IPLD
  • PLD
  • Pulsed laser deposition
  • Thickness homogenization
  • Thin film
  • Titanium oxide

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Egerhazi, L., Geretovszky, Z., & Bari, F. (2011). Thin film homogenization by inverse pulsed laser deposition. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 7747). [774706] https://doi.org/10.1117/12.882050

Thin film homogenization by inverse pulsed laser deposition. / Egerhazi, Laszlo; Geretovszky, Z.; Bari, F.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7747 2011. 774706.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Egerhazi, L, Geretovszky, Z & Bari, F 2011, Thin film homogenization by inverse pulsed laser deposition. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 7747, 774706, 16th International School on Quantum Electronics: Laser Physics and Applications, Nessebar, Bulgaria, 9/20/10. https://doi.org/10.1117/12.882050
Egerhazi L, Geretovszky Z, Bari F. Thin film homogenization by inverse pulsed laser deposition. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7747. 2011. 774706 https://doi.org/10.1117/12.882050
Egerhazi, Laszlo ; Geretovszky, Z. ; Bari, F. / Thin film homogenization by inverse pulsed laser deposition. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7747 2011.
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