Thin film dissolution into semi-infinite substrates: Surprising interface kinetics and dissolution modes

Z. Erdélyi, Ch Girardeaux, D. Beke, J. Bernardini, A. Portavoce, G. L. Katona, Z. Balogh, A. Rolland

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Depending on the thermodynamic, structural and diffusion properties of the system, a thin deposit dissolves into a substrate by different mechanisms. In this communication these different behaviours, investigated by surface analytical techniques (AES, XPS, STM, UPS, etc) [1-7], are reviewed. The experiments were also supported by computer simulations. The obtained results are compared and it is summarized how different parameters influence the dissolution of a thin film in a substrate. Furthermore, it is show that i) the volume dissolution kinetics is different on the atomic-/nano-scale than on the microscopic scale due to the diffusion asymmetry ii) the volume and GB diffusion in one measurement can be separated and iii) pure (C-kinetic) GB diffusivities can be determined from thin film kinetics measurements performed under adequate conditions.

Original languageEnglish
Title of host publicationDefect and Diffusion Forum
Pages573-585
Number of pages13
Volume289-292
DOIs
Publication statusPublished - 2009
Event7th International Conference on Diffusion in Materials - Lanzarote, Spain
Duration: Oct 28 2008Oct 31 2008

Publication series

NameDefect and Diffusion Forum
Volume289-292
ISSN (Print)10120386

Other

Other7th International Conference on Diffusion in Materials
CountrySpain
CityLanzarote
Period10/28/0810/31/08

Fingerprint

dissolving
Dissolution
Thin films
Kinetics
kinetics
Substrates
thin films
diffusivity
thermodynamic properties
computerized simulation
communication
deposits
asymmetry
Deposits
X ray photoelectron spectroscopy
Thermodynamics
Communication
Computer simulation
Experiments

Keywords

  • AES
  • Anomalous diffusion kinetics
  • Computer simulations and experiments
  • Solid state reaction
  • Thin film dissolution
  • XPS
  • XRD

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Radiation

Cite this

Erdélyi, Z., Girardeaux, C., Beke, D., Bernardini, J., Portavoce, A., Katona, G. L., ... Rolland, A. (2009). Thin film dissolution into semi-infinite substrates: Surprising interface kinetics and dissolution modes. In Defect and Diffusion Forum (Vol. 289-292, pp. 573-585). (Defect and Diffusion Forum; Vol. 289-292). https://doi.org/10.4028/www.scientific.net/DDF.289-292.573

Thin film dissolution into semi-infinite substrates : Surprising interface kinetics and dissolution modes. / Erdélyi, Z.; Girardeaux, Ch; Beke, D.; Bernardini, J.; Portavoce, A.; Katona, G. L.; Balogh, Z.; Rolland, A.

Defect and Diffusion Forum. Vol. 289-292 2009. p. 573-585 (Defect and Diffusion Forum; Vol. 289-292).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Erdélyi, Z, Girardeaux, C, Beke, D, Bernardini, J, Portavoce, A, Katona, GL, Balogh, Z & Rolland, A 2009, Thin film dissolution into semi-infinite substrates: Surprising interface kinetics and dissolution modes. in Defect and Diffusion Forum. vol. 289-292, Defect and Diffusion Forum, vol. 289-292, pp. 573-585, 7th International Conference on Diffusion in Materials, Lanzarote, Spain, 10/28/08. https://doi.org/10.4028/www.scientific.net/DDF.289-292.573
Erdélyi Z, Girardeaux C, Beke D, Bernardini J, Portavoce A, Katona GL et al. Thin film dissolution into semi-infinite substrates: Surprising interface kinetics and dissolution modes. In Defect and Diffusion Forum. Vol. 289-292. 2009. p. 573-585. (Defect and Diffusion Forum). https://doi.org/10.4028/www.scientific.net/DDF.289-292.573
Erdélyi, Z. ; Girardeaux, Ch ; Beke, D. ; Bernardini, J. ; Portavoce, A. ; Katona, G. L. ; Balogh, Z. ; Rolland, A. / Thin film dissolution into semi-infinite substrates : Surprising interface kinetics and dissolution modes. Defect and Diffusion Forum. Vol. 289-292 2009. pp. 573-585 (Defect and Diffusion Forum).
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