Thickness distribution of carbon nitride films grown by inverse-pulsed laser deposition

Research output: Contribution to journalConference article

23 Citations (Scopus)

Abstract

Recently, we proposed a new PLD geometry, termed as inverse PLD, in which the backward motion of the ablated species was utilized for film growth on substrates lying in the target plane. Qualitative measurements revealed that in this geometry the growth rate of carbon nitride films was comparable to or even exceeded that of the traditional geometry in the critical pressure domain of reactive PLD. The knowledge of the lateral distribution of the growth rate is of primary importance for both applications and modelling. Here first quantitative data on the dependence of the lateral distribution of deposition rate of carbon nitride films, fabricated by KrF excimer laser ablation of a rotating graphite target, on N 2 pressure are reported. Thickness distributions of films grown on Si substrates within the 0.5-50 Pa pressure window have been recorded along the axes of symmetry of the laser spot by stylus profilometry. At all background pressures, the thickness decreases exponentially with increasing distance from the ablating laser spot. The elliptical symmetry typical at low pressures and near to the spot shifts to circular with increasing pressure and distance. The existence of flip-over suggests that recondensation of the plasma species without scattering on the surrounding atmosphere effectively contributes to IPLD film growth.

Original languageEnglish
Pages (from-to)182-187
Number of pages6
JournalApplied Surface Science
Volume247
Issue number1-4
DOIs
Publication statusPublished - Jul 15 2005
EventProceedings of the European Materials Research Society 2004 - Symposium N EMRS-2004 -
Duration: May 24 2004May 28 2004

Keywords

  • Carbon nitride
  • Growth process
  • Inverse pulsed laser deposition
  • Laser plasma
  • Thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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