Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction

G. Molnár, G. Pető, E. Zsoldos, Z. Horváth, N. Q. Khanh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

The solid phase reaction of Fe thin films with (111) Si substrate was investigated at constant annealing temperature and time (700°C, 7 minutes) as a function of the initial iron film thickness (from 5 nm to 27.5 nm in 2.5 nm steps). The formed phases were analysed by X-ray diffraction, Rutherford backscattering and transmission electron microscopy and optical microscopy. After annealing FeSi phase was detected in the thinner samples. Samples with Fe layers thicker than 12.5 nm contained a β-FeSi2 phase. This special phase sequence was explained with the help of a nucleation controlled phase formation model, taking into consideration the critical radius of nuclei of the new phase. The advantages of using the film thickness as a variable during investigation of solid phase thin film reactions and the probable substrate effects are also discussed.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages337-342
Number of pages6
Volume402
Publication statusPublished - 1996
EventProceedings of the 1995 MRS Fall Symposium - Boston, MA, USA
Duration: Nov 27 1995Nov 30 1995

Other

OtherProceedings of the 1995 MRS Fall Symposium
CityBoston, MA, USA
Period11/27/9511/30/95

Fingerprint

Film thickness
Annealing
Thin films
Rutherford backscattering spectroscopy
Substrates
Optical microscopy
Nucleation
Iron
Transmission electron microscopy
X ray diffraction
Temperature

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Molnár, G., Pető, G., Zsoldos, E., Horváth, Z., & Khanh, N. Q. (1996). Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction. In Materials Research Society Symposium - Proceedings (Vol. 402, pp. 337-342). Materials Research Society.

Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction. / Molnár, G.; Pető, G.; Zsoldos, E.; Horváth, Z.; Khanh, N. Q.

Materials Research Society Symposium - Proceedings. Vol. 402 Materials Research Society, 1996. p. 337-342.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Molnár, G, Pető, G, Zsoldos, E, Horváth, Z & Khanh, NQ 1996, Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction. in Materials Research Society Symposium - Proceedings. vol. 402, Materials Research Society, pp. 337-342, Proceedings of the 1995 MRS Fall Symposium, Boston, MA, USA, 11/27/95.
Molnár G, Pető G, Zsoldos E, Horváth Z, Khanh NQ. Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction. In Materials Research Society Symposium - Proceedings. Vol. 402. Materials Research Society. 1996. p. 337-342
Molnár, G. ; Pető, G. ; Zsoldos, E. ; Horváth, Z. ; Khanh, N. Q. / Thickness dependent phase formation in Fe thin film and Si substrate solid phase reaction. Materials Research Society Symposium - Proceedings. Vol. 402 Materials Research Society, 1996. pp. 337-342
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