Thick self-supporting amorphous germanium films

Á Barna, P. B. Barna, J. F. Pócza, I. Pozsgai, A. Dévényi

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Abstract

A method is described for preparing ≥5 μm self-supporting amorphous germanium films of high purity. Germanium is evaporated by electron bombardment which results in ionization of 2-5% of the molecules leaving the source. High stress in the condensed film caused by thermal expansion differences at the substrate-film boundary could be deterred by a plastic layer. By regulating the substrate temperature during the deposition, smooth planar films could be produced.

Original languageEnglish
Pages (from-to)549-552
Number of pages4
JournalNuclear instruments and methods
Volume102
Issue number3
DOIs
Publication statusPublished - Aug 1 1972

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ASJC Scopus subject areas

  • Medicine(all)

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