Thermoelectrical modelling and simulation of devices based on VO2

László Pohl, Soma Ur, J. Mizsei

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Limits of development of conventional silicon-based integrated circuits get closer. More and more effort is done to develop new devices for integrated circuits. A promising structure is based on the semiconductor-to-metal phase change of vanadium-dioxide at about 67 °C. In these circuits the information is carried by combined thermal and electrical currents. For device modelling and circuit design, accurate distributed electro-thermal transient simulation is mandatory. This paper is the first one to present an electro-thermal transient simulation method for VO2 devices operating in real-world conditions. The paper presents three VO2 material models, the algorithmic extension of an electro-thermal field simulator to be able to handle hysteresis and the transient simulation issues of VO2 and the modelling of VO2 based devices. The paper compares measured and simulated device characteristics.

Original languageEnglish
Pages (from-to)387-394
Number of pages8
JournalMicroelectronics Reliability
Volume79
DOIs
Publication statusPublished - Dec 1 2017

Fingerprint

Integrated circuits
simulation
integrated circuits
Networks (circuits)
Silicon
Vanadium
convective flow
Hysteresis
dioxides
Simulators
Metals
vanadium
simulators
Semiconductor materials
hysteresis
Hot Temperature
silicon
metals
vanadium dioxide

Keywords

  • Electro-thermal simulation
  • FVM
  • Thermal-electronic circuits
  • VO2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Safety, Risk, Reliability and Quality
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Thermoelectrical modelling and simulation of devices based on VO2 . / Pohl, László; Ur, Soma; Mizsei, J.

In: Microelectronics Reliability, Vol. 79, 01.12.2017, p. 387-394.

Research output: Contribution to journalArticle

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