Thermal stability of Mo-V epitaxial multilayers

A. Dudás, G. Langer, D. Beke, M. Kis-Varga, L. Daróczi, Z. Erdélyi

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Epitaxial crystalline Mo-V multilayers are investigated based on structure degradation during annealing between 1000 and 1250 K using TEM and X-ray diffraction. The effect of interdiffusion coefficient strong concentration dependence on the diffusional homogenization is analyzed. Time evolution of the small and high angle diffraction Bragg peaks, considering the oxygen-uptake of V, is studied. It is shown that normal bulk diffusional homogenization can take place and the interdiffusion coefficient can be determined at good vacuum and above a given temperature.

Original languageEnglish
Pages (from-to)2008-2013
Number of pages6
JournalJournal of Applied Physics
Volume86
Issue number4
Publication statusPublished - Aug 15 1999

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homogenizing
thermal stability
coefficients
diffraction
degradation
vacuum
transmission electron microscopy
annealing
oxygen
x rays
temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Thermal stability of Mo-V epitaxial multilayers. / Dudás, A.; Langer, G.; Beke, D.; Kis-Varga, M.; Daróczi, L.; Erdélyi, Z.

In: Journal of Applied Physics, Vol. 86, No. 4, 15.08.1999, p. 2008-2013.

Research output: Contribution to journalArticle

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AU - Erdélyi, Z.

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