Thermal stability of adsorbed CH3NCO on Cu{110} AND Pt{110} from vibrational and photoelectron spectroscopies

Mark Surman, F. Solymosi, Renee D. Diehl, Peter Hofmann, David A. King

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The thermal stability of CH3NCO adsorbed on Cu{110} and Pt{110} is investigated using HREELS, TPD, and ARUPS. CH3NCO desorbs largely without fragmentation from Cu{110}, but on Pt{110} only about 20% of the adsorbed CH3NCO desorbs intact, with 80% decomposing on the surface at T > 200 K into CO(a), H(a), CHx(a), N(a) and NHy(a) fragments. The kinetics of the surface decomposition were characterised for 220 < T < 300 K by HREELS and the activation energy for CH3NCO decomposition was found to vary strongly as a function of coverage.

Original languageEnglish
Pages (from-to)144-154
Number of pages11
JournalSurface Science
Volume146
Issue number1
DOIs
Publication statusPublished - Oct 2 1984

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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