Thermal regrowth of Si( 100) damaged by Ne, Ar, and Xe ion bombardment

G. Petõ, J. Kanski

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Thermally induced regrowth of Si(100) after ion sputtering with 3 keV Ne, Ar, and Xe ions has been studied with angle resolved photoemission. Significant differences are found in the regrowth, depending on the kind of ions used for the sputtering. While the Ne sputtered surface was fully recovered after annealing at 750°C, the Ar and Xe treated surfaces remained disordered after such treatment. It is concluded that Ne ion bombardment induces a different defect system than that obtained after bombardment with Ar or Xe ions at the same energy.

Original languageEnglish
Pages (from-to)459-463
Number of pages5
JournalApplied Surface Science
Volume103
Issue number4
DOIs
Publication statusPublished - Dec 1996

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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