Theoretical study of the mechanism of dry oxidation of 4H-SiC

Jan M. Knaup, Peter Deák, Thomas Frauenheim, Adam Gali, Zoltán Hajnal, W. J. Choyke

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133 Citations (Scopus)

Abstract

Possible defect structures, arising from the interaction of O2 molecules with an ideal portion of the SiC SiO2 interface, have been investigated systematically using density functional theory. Based on the calculated total energies and assuming thermal quasiequilibrium during oxidation, the most likely routes leading to complete oxidation have been determined. The defect structures produced along these routes will remain at the interface in significant concentration when stopping the oxidation process. The results obtained for their properties are well supported by experimental findings about the SiC SiO2 interface. It is found that carbon-carbon bonds can explain most of the observed interface states but not the high density near the conduction band of 4H-SiC.

Original languageEnglish
Article number235321
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume71
Issue number23
DOIs
Publication statusPublished - Jun 15 2005

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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