The structural and mechanical characterization of TiC and TiC/Ti thin films grown by DC magnetron sputtering

Zsolt Fogarassy, Nikolett Oláh, Ildikó Cora, Zsolt Endre Horváth, Tamás Csanádi, Attila Sulyok, Katalin Balázsi

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5 Citations (Scopus)


The formation of TiC and Ti phases and their influence on their mechanical properties was studied in this work. Thin layers were deposited by DC magnetron sputtering at room temperature in ultrahigh vacuum from Ti and C targets. Cubic TiC phase (c-TiC) was formed from 58 to 86 at.% Ti content. First formation of hexagonal Ti (h-Ti) occurred from 86 at.% Ti content. The c-TiC disappears from 90 at.% Ti content. Films with 86 at.% Ti content the c-TiC structure can transform to h-Ti by sequential stacking faults. Dominance of c-TiC(111) texture with increasing Ti content was observed. The hardness of thin films agree with structural observations. The highest hardness value (∼26 GPa) showed the c-TiC thin film with 67 at% Ti content. The nanohardness values showed decreasing character with increasing Ti content over 70 at.%. The lowest values of nanohardness (∼10 GPa) was observed for thin films with only h-Ti phase.

Original languageEnglish
Pages (from-to)2886-2892
Number of pages7
JournalJournal of the European Ceramic Society
Issue number7
Publication statusPublished - Jul 2018



  • DC magnetron sputtering
  • Hardness
  • Nanocomposite
  • TEM
  • TiC

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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