The light scattering of dielectric films

A. Lutter, K. Ferencz

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The Rayleigh scattering of dielectric films was measured at 441.6 nm wavelength. The total scattering losses of TiO2, SiO2, ZnS and MgF2 films show a close correlation with the evaporation parameters. The light scattering of the TiO2SiO2 and ZnSMgF2 film systems can be explained by scattering at the interfaces. By comparing curves of the light scattering as a function of scattering angle with the results of a numerical computing method the statistical parameters of the interfaces were obtained and were found to be in good agreement with electron microscope results.

Original languageEnglish
Pages (from-to)185-189
Number of pages5
JournalThin Solid Films
Volume57
Issue number1
DOIs
Publication statusPublished - Feb 15 1979

Fingerprint

Dielectric films
Light scattering
light scattering
Scattering
scattering
Rayleigh scattering
Evaporation
Electron microscopes
electron microscopes
evaporation
Wavelength
curves
wavelengths

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

The light scattering of dielectric films. / Lutter, A.; Ferencz, K.

In: Thin Solid Films, Vol. 57, No. 1, 15.02.1979, p. 185-189.

Research output: Contribution to journalArticle

Lutter, A. ; Ferencz, K. / The light scattering of dielectric films. In: Thin Solid Films. 1979 ; Vol. 57, No. 1. pp. 185-189.
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