The influence of ion beam mixed TiSi2 layers on reverse characteristics of diodes

C. Dehm, E. P. Burte, J. Gyulai, H. Zimmermann

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Diodes with shallow p+n junctions were contacted with titanium silicide films which were formed by ion beam mixing with germanium. The leakage current of these diodes was observed to be dominated by a generation mechanism in the space charge layer. Deep level transient spectroscopy and secondary-ion mass spectroscopy measurements revealed that ion beam mixing with heavy ions leads to recoil implantation of titanium atoms into the silicon substrate. The temperature and reverse bias behavior of the leakage current could be consistently explained by Shockley-Read-Hall generation mechanism [Phys. Rev. 87, 385, 387 (1952)] and by Poole-Frenkel barrier lowering [Phys. Rev. 54, 647 (1938)] of the double donor level Ti+/++ at Ev+0.2 eV.4.

Original languageEnglish
Pages (from-to)4365-4369
Number of pages5
JournalJournal of Applied Physics
Volume71
Issue number9
DOIs
Publication statusPublished - Dec 1 1992

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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