The impedance related to the electrochemical hydrogen insertion into WO3 films - On the applicability of the diffusion-trapping model

L. Bóbics, L. Sziráki, G. Láng

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Impedance analysis of electrochemically prepared WO3 films has been carried out in order to investigate the applicability of the diffusion-trapping model to the analysis of impedance spectra related to electrochemical hydrogen insertion. The impedance spectra measured under different conditions have been analyzed by using CNLS fitting. It has been shown, that the expressions derived for the diffusion-trapping model adequately describe the impedance response of the system. Despite of the great number of adjustable parameters many of them could be determined with a good statistics, and reasonable estimated mean values have been obtained for the others. The reliability of the estimated parameters was checked by comparing the results with existing experimental data.

Original languageEnglish
Pages (from-to)283-287
Number of pages5
JournalElectrochemistry Communications
Volume10
Issue number2
DOIs
Publication statusPublished - Feb 2008

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Hydrogen
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Keywords

  • CNLS fitting
  • Diffusion-trapping model
  • Electrochemical impedance
  • WO films

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Analytical Chemistry
  • Electrochemistry

Cite this

The impedance related to the electrochemical hydrogen insertion into WO3 films - On the applicability of the diffusion-trapping model. / Bóbics, L.; Sziráki, L.; Láng, G.

In: Electrochemistry Communications, Vol. 10, No. 2, 02.2008, p. 283-287.

Research output: Contribution to journalArticle

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