The effect of oxygen on the structure and growth morphology of vapour deposited Cu films

F. M. Reicha, M. El Hiti, P. B. Barna

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Abstract

The effect of oxygen on the structural development of evaporated copper films was studied. Results of TEM and SEM investigations revealed a correlation of the surface growth morphology and the grain size distribution to the partial pressure of oxygen and the film thickness. The development of growth hillocks is interpreted by considering a crystal face dependence of surface microchemistry.

Original languageEnglish
Pages (from-to)93-96
Number of pages4
JournalVacuum
Volume37
Issue number1-2
DOIs
Publication statusPublished - 1987

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ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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