The effect of oxygen on the structure and growth morphology of vapour deposited Cu films

F. M. Reicha, M. El Hiti, P. B. Barna

Research output: Contribution to journalArticle

2 Citations (Scopus)


The effect of oxygen on the structural development of evaporated copper films was studied. Results of TEM and SEM investigations revealed a correlation of the surface growth morphology and the grain size distribution to the partial pressure of oxygen and the film thickness. The development of growth hillocks is interpreted by considering a crystal face dependence of surface microchemistry.

Original languageEnglish
Pages (from-to)93-96
Number of pages4
Issue number1-2
Publication statusPublished - 1987


ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this