The effect of evaporation arrangement on the morphology and structure of vacuum-deposited thin films

A. Barna, P. Barna, J. F. Pócza, I. Pozsgai

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

It is shown that the structure and morphology of vacuum-deposited thin films, depending on the built-in impurities of the residual gases, are highly influenced by the evaporation geometry through the self-gettering property of the evaporants. The pressure measured in two opposite directions in the plane of the substrate shows the impinging rate of residual gas molecules to be determined by the evaporation geometry. The results obtained for Ti are in good agreement with the data calculated for non-isotropicc systems of Ti evaporation getter-pumps.

Original languageEnglish
Pages (from-to)201-208
Number of pages8
JournalThin Solid Films
Volume5
Issue number4
DOIs
Publication statusPublished - 1970

Fingerprint

Evaporation
residual gas
evaporation
Vacuum
Thin films
vacuum
thin films
Gases
Geometry
geometry
Pumps
Impurities
pumps
impurities
Molecules
Substrates
molecules
Direction compound

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

The effect of evaporation arrangement on the morphology and structure of vacuum-deposited thin films. / Barna, A.; Barna, P.; Pócza, J. F.; Pozsgai, I.

In: Thin Solid Films, Vol. 5, No. 4, 1970, p. 201-208.

Research output: Contribution to journalArticle

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