Testing optical damage for 157 nm lithography

Richard Morton, Todd Embree, Z. Bor, Chris Van Peski

Research output: Contribution to journalArticle

Abstract

The preliminary life test results for calcium fluoride irradiation at 157 nm by fluorine laser beams is being discussed. The sample housing and beam delivery tubes are purged with ultra pure nitrogen to keep the back-ground oxygen level low as possible and to sweep away potential organic gases liberated during experimentation. Data is collected to evaluate induced changes in transmission, wavefront distortion and birefringence. The result shows a slight improvement at 4 billion shots with respect to 1 billion shots.

Original languageEnglish
Pages (from-to)57-60
Number of pages4
JournalSemiconductor International
Volume25
Issue number2
Publication statusPublished - Feb 2002

Fingerprint

Calcium Fluoride
Optical testing
Calcium fluoride
Birefringence
Fluorine
Wave transmission
Wavefronts
Lithography
shot
Laser beams
Lasers
Nitrogen
lithography
Gases
Irradiation
Oxygen
damage
calcium fluorides
experimentation
birefringence

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Morton, R., Embree, T., Bor, Z., & Van Peski, C. (2002). Testing optical damage for 157 nm lithography. Semiconductor International, 25(2), 57-60.

Testing optical damage for 157 nm lithography. / Morton, Richard; Embree, Todd; Bor, Z.; Van Peski, Chris.

In: Semiconductor International, Vol. 25, No. 2, 02.2002, p. 57-60.

Research output: Contribution to journalArticle

Morton, R, Embree, T, Bor, Z & Van Peski, C 2002, 'Testing optical damage for 157 nm lithography', Semiconductor International, vol. 25, no. 2, pp. 57-60.
Morton R, Embree T, Bor Z, Van Peski C. Testing optical damage for 157 nm lithography. Semiconductor International. 2002 Feb;25(2):57-60.
Morton, Richard ; Embree, Todd ; Bor, Z. ; Van Peski, Chris. / Testing optical damage for 157 nm lithography. In: Semiconductor International. 2002 ; Vol. 25, No. 2. pp. 57-60.
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