Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition

T. Szörényi, P. González, E. Garcá, J. Pou, D. Fernández, J. Serra, B. León, M. Pérez-Amor

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

ArF excimer laser-induced chemical vapor deposition from SiH4 and N2O precursors in parallel configuration offers unique possibilities for fine and effective control of both the deposition rate and film properties by tuning exclusively the distance between the laser beam and the substrate surface, even if the gas composition and pressure remain constant. By depositing from N2O-rich mixtures, the deposition rate, density and structure of the films can be varied in a controlled way, while lower nitrous oxide-to-silane ratios allow tailoring of film composition as well. Layer structures of designed properties can be deposited by simple realignment of the position of the laser beam.

Original languageEnglish
Pages (from-to)80-83
Number of pages4
JournalThin Solid Films
Volume241
Issue number1-2
DOIs
Publication statusPublished - Apr 1 1994

Fingerprint

Silicon oxides
silicon oxides
Oxide films
Laser beams
oxide films
Chemical vapor deposition
Tuning
tuning
vapor deposition
laser beams
Deposition rates
Lasers
Substrates
lasers
Silanes
nitrous oxides
gas composition
Nitrous Oxide
Excimer lasers
Chemical analysis

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition. / Szörényi, T.; González, P.; Garcá, E.; Pou, J.; Fernández, D.; Serra, J.; León, B.; Pérez-Amor, M.

In: Thin Solid Films, Vol. 241, No. 1-2, 01.04.1994, p. 80-83.

Research output: Contribution to journalArticle

Szörényi, T. ; González, P. ; Garcá, E. ; Pou, J. ; Fernández, D. ; Serra, J. ; León, B. ; Pérez-Amor, M. / Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition. In: Thin Solid Films. 1994 ; Vol. 241, No. 1-2. pp. 80-83.
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