Synthesis of metal-nitride films by pulsed laser deposition methods

L. Fabian, L. Nánai, M. Martino, A. Luches, I. N. Mihailescu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Pulsed Laser Deposition (ablation-deposition) method (PLD) is widely used nowadays to produce smooth, homogeneous thin films on solid (semiconductors) surfaces for microelectronic's purpose. Different metal-nitride films as well as nitrides of W, V, Ta, Ni, Co, Pb have been produced in NH3 and N2 atmosphere of a few (10-6 mbar) on Si surfaces with orientation 〈100〉. In the reaction chamber the pulses of excimer laser (λ = 308 nm, τFWHM = 25 ns, repetition rate f = 10 Hz, number of pulses a few thousands) at fluence of 5.8 J/cm2 (I = 0.19 GW/cm2) were directed at angle of incidence of 45° to the metallic sheet placed at distance 4.0 cm to the Si substrate. The metallic target was rotated at ≈3 Hz. Different surface analyzing methods revealed that smooth, homogeneous thin film of the thickness of 20-100 nm were grown on the substrate surface. The chemical composition of the layers varied of metal-silicides to metal-nitrides. In some cases the appearance of carbon and oxygen consisting mixtures such as VNCO, N13Si9O1.5C6 and WN were observed. The film structures might be considered mostly amorphous (Pb, W) according to the data of GR-XRD measurements.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages317-322
Number of pages6
Volume4070
Publication statusPublished - 2000
EventALT '99 International Conference on 'Advanced Laser Technologies - Potenza-Lecce, Italy
Duration: Sep 20 1999Sep 24 1999

Other

OtherALT '99 International Conference on 'Advanced Laser Technologies
CityPotenza-Lecce, Italy
Period9/20/999/24/99

Fingerprint

metal nitrides
Pulsed laser deposition
Nitrides
pulsed laser deposition
synthesis
Metals
Thin films
Silicides
silicides
Excimer lasers
Substrates
thin films
Ablation
Full width at half maximum
pulses
microelectronics
Microelectronics
excimer lasers
ablation
nitrides

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Fabian, L., Nánai, L., Martino, M., Luches, A., & Mihailescu, I. N. (2000). Synthesis of metal-nitride films by pulsed laser deposition methods. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4070, pp. 317-322). Society of Photo-Optical Instrumentation Engineers.

Synthesis of metal-nitride films by pulsed laser deposition methods. / Fabian, L.; Nánai, L.; Martino, M.; Luches, A.; Mihailescu, I. N.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4070 Society of Photo-Optical Instrumentation Engineers, 2000. p. 317-322.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fabian, L, Nánai, L, Martino, M, Luches, A & Mihailescu, IN 2000, Synthesis of metal-nitride films by pulsed laser deposition methods. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 4070, Society of Photo-Optical Instrumentation Engineers, pp. 317-322, ALT '99 International Conference on 'Advanced Laser Technologies, Potenza-Lecce, Italy, 9/20/99.
Fabian L, Nánai L, Martino M, Luches A, Mihailescu IN. Synthesis of metal-nitride films by pulsed laser deposition methods. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4070. Society of Photo-Optical Instrumentation Engineers. 2000. p. 317-322
Fabian, L. ; Nánai, L. ; Martino, M. ; Luches, A. ; Mihailescu, I. N. / Synthesis of metal-nitride films by pulsed laser deposition methods. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4070 Society of Photo-Optical Instrumentation Engineers, 2000. pp. 317-322
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