Surface roughness in Langmuir-Blodgett multilayer films studied by AFM and X-ray diffraction

N. Rozlosnik, G. Antal, T. Pusztai, G. Faigel

Research output: Contribution to journalArticle

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Abstract

Langmuir-Blodgett multilayer films consisting of up to 100 layers of cadmium-substituted arachidic acid on silicon wafers have been studied. The samples were deposited from a water subphase containing Cd2+ ions by using an alternate-layer Langmuir-Blodgett (LB) trough under computer control. Long-range orientational order was observed by atomic force microscopy on the surface of films with a small number of layers. X-ray reflectivity curves showed regularly spaced Bragg peaks arising from multilayer structure. The periodicity of the LB film is in agreement with twice the estimated molecular length, which confirms that the multilayer structure has a bilayer (Y) configuration. We demonstrate that the growth process of the LB films must have been stochastic. Our results are in good agreement with the Eden model of growth.

Original languageEnglish
Pages (from-to)215-218
Number of pages4
JournalSupramolecular Science
Volume4
Issue number3-4
DOIs
Publication statusPublished - Sep 1997

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Langmuir Blodgett films
Multilayer films
Multilayers
Surface roughness
X ray diffraction
Computer control
Silicon wafers
Cadmium
Atomic force microscopy
X rays
Acids
Ions
Water

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Surface roughness in Langmuir-Blodgett multilayer films studied by AFM and X-ray diffraction. / Rozlosnik, N.; Antal, G.; Pusztai, T.; Faigel, G.

In: Supramolecular Science, Vol. 4, No. 3-4, 09.1997, p. 215-218.

Research output: Contribution to journalArticle

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