Summary of ISO/TC201 technical report

ISO/TR 18392: 2005 - Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for determining backgrounds

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

ISO Technical Report 18392 provides the guidance for determining backgrounds in X-ray photoelectron spectra. The methods of background determination described in this report are applicable for the quantitative evaluation of the spectra of photoelectrons and Auger electrons excited by X-rays from solid surfaces and surface nanostructures.

Original languageEnglish
Pages (from-to)1173-1175
Number of pages3
JournalSurface and Interface Analysis
Volume38
Issue number7
DOIs
Publication statusPublished - Jul 2006

Fingerprint

Photoelectrons
chemical analysis
photoelectrons
X ray photoelectron spectroscopy
photoelectron spectroscopy
X rays
Chemical analysis
solid surfaces
Nanostructures
x rays
Electrons
evaluation
electrons

Keywords

  • Background determination
  • Inelastic and elastic electron scattering
  • International Organization for Standardization
  • ISO
  • Quantitative surface analysis
  • X-ray photoelectron spectroscopy
  • XPS

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

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title = "Summary of ISO/TC201 technical report: ISO/TR 18392: 2005 - Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for determining backgrounds",
abstract = "ISO Technical Report 18392 provides the guidance for determining backgrounds in X-ray photoelectron spectra. The methods of background determination described in this report are applicable for the quantitative evaluation of the spectra of photoelectrons and Auger electrons excited by X-rays from solid surfaces and surface nanostructures.",
keywords = "Background determination, Inelastic and elastic electron scattering, International Organization for Standardization, ISO, Quantitative surface analysis, X-ray photoelectron spectroscopy, XPS",
author = "L. K{\"o}v{\'e}r",
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KW - ISO

KW - Quantitative surface analysis

KW - X-ray photoelectron spectroscopy

KW - XPS

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