Sub-quarter micron contact hole fabrication using annular illumination

Miklós Erdélyi, Z. Bor, Gábor Szabó, Joseph R. Cavallaro, Michael C. Smayling, Frank K. Tittel, William L. Wilson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity of the photoresist, the resolving power was enhanced by 52% and it was possible to pattern a 0,28 μm contact hole in photoresist deposited on a silica substrate. This technique is capable of fabricating sub-quarter micron holes using excimer laser radiation at 193 nm.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsG.E. Fuller
Pages88-93
Number of pages6
Volume2726
DOIs
Publication statusPublished - 1996
EventOptical Microlithography IX - Santa Clara, CA, United States
Duration: Mar 13 1996Mar 15 1996

Other

OtherOptical Microlithography IX
CountryUnited States
CitySanta Clara, CA
Period3/13/963/15/96

Fingerprint

Photoresists
electric contacts
Lighting
illumination
photoresists
Fabrication
fabrication
Optical resolving power
Excimer lasers
Laser radiation
Imaging systems
spatial filtering
Demonstrations
Silica
excimer lasers
Substrates
nonlinearity
laser beams
silicon dioxide

Keywords

  • Annular aperture
  • Depth of focus
  • Microlithography

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Erdélyi, M., Bor, Z., Szabó, G., Cavallaro, J. R., Smayling, M. C., Tittel, F. K., & Wilson, W. L. (1996). Sub-quarter micron contact hole fabrication using annular illumination. In G. E. Fuller (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2726, pp. 88-93) https://doi.org/10.1117/12.240953

Sub-quarter micron contact hole fabrication using annular illumination. / Erdélyi, Miklós; Bor, Z.; Szabó, Gábor; Cavallaro, Joseph R.; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / G.E. Fuller. Vol. 2726 1996. p. 88-93.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Erdélyi, M, Bor, Z, Szabó, G, Cavallaro, JR, Smayling, MC, Tittel, FK & Wilson, WL 1996, Sub-quarter micron contact hole fabrication using annular illumination. in GE Fuller (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2726, pp. 88-93, Optical Microlithography IX, Santa Clara, CA, United States, 3/13/96. https://doi.org/10.1117/12.240953
Erdélyi M, Bor Z, Szabó G, Cavallaro JR, Smayling MC, Tittel FK et al. Sub-quarter micron contact hole fabrication using annular illumination. In Fuller GE, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2726. 1996. p. 88-93 https://doi.org/10.1117/12.240953
Erdélyi, Miklós ; Bor, Z. ; Szabó, Gábor ; Cavallaro, Joseph R. ; Smayling, Michael C. ; Tittel, Frank K. ; Wilson, William L. / Sub-quarter micron contact hole fabrication using annular illumination. Proceedings of SPIE - The International Society for Optical Engineering. editor / G.E. Fuller. Vol. 2726 1996. pp. 88-93
@inproceedings{e8c3b8ed67e346d28698615f6a11c89f,
title = "Sub-quarter micron contact hole fabrication using annular illumination",
abstract = "Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity of the photoresist, the resolving power was enhanced by 52{\%} and it was possible to pattern a 0,28 μm contact hole in photoresist deposited on a silica substrate. This technique is capable of fabricating sub-quarter micron holes using excimer laser radiation at 193 nm.",
keywords = "Annular aperture, Depth of focus, Microlithography",
author = "Mikl{\'o}s Erd{\'e}lyi and Z. Bor and G{\'a}bor Szab{\'o} and Cavallaro, {Joseph R.} and Smayling, {Michael C.} and Tittel, {Frank K.} and Wilson, {William L.}",
year = "1996",
doi = "10.1117/12.240953",
language = "English",
volume = "2726",
pages = "88--93",
editor = "G.E. Fuller",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

TY - GEN

T1 - Sub-quarter micron contact hole fabrication using annular illumination

AU - Erdélyi, Miklós

AU - Bor, Z.

AU - Szabó, Gábor

AU - Cavallaro, Joseph R.

AU - Smayling, Michael C.

AU - Tittel, Frank K.

AU - Wilson, William L.

PY - 1996

Y1 - 1996

N2 - Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity of the photoresist, the resolving power was enhanced by 52% and it was possible to pattern a 0,28 μm contact hole in photoresist deposited on a silica substrate. This technique is capable of fabricating sub-quarter micron holes using excimer laser radiation at 193 nm.

AB - Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity of the photoresist, the resolving power was enhanced by 52% and it was possible to pattern a 0,28 μm contact hole in photoresist deposited on a silica substrate. This technique is capable of fabricating sub-quarter micron holes using excimer laser radiation at 193 nm.

KW - Annular aperture

KW - Depth of focus

KW - Microlithography

UR - http://www.scopus.com/inward/record.url?scp=0030316051&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030316051&partnerID=8YFLogxK

U2 - 10.1117/12.240953

DO - 10.1117/12.240953

M3 - Conference contribution

AN - SCOPUS:0030316051

VL - 2726

SP - 88

EP - 93

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Fuller, G.E.

ER -