Structure and morphology of aluminium doped Zinc-oxide layers prepared by atomic layer deposition

Zs Baji, Z. Lábadi, Z. E. Horváth, I. Bársony

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13 Citations (Scopus)

Abstract

The aim of this work is to study the effects of deposition temperature and aluminium incorporation on the crystalline properties, orientation and grain size of atomic layer deposited ZnO layers. X-ray diffraction analysis revealed a change in the dominant crystallite orientation with increasing substrate temperature. The most perfect crystal structure and largest grain size was found at 2 at.% aluminium content. Accumulation of compressive strain developed a monotonous increase with the growth temperature. Electric resistivity showed no anisotropy despite the change in the orientation, therefore the dominant conduction mechanism is not grain boundary related.

Original languageEnglish
Pages (from-to)4703-4706
Number of pages4
JournalThin Solid Films
Volume520
Issue number14
DOIs
Publication statusPublished - May 1 2012

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Keywords

  • Aluminium doping
  • Atomic layer deposition
  • Orientation
  • Resistivity
  • TCO
  • XRD
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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