Structure and growth morphology of SiOx films deposited on NaCl (001) faces

M. El Hiti, P. B. Barna, F. M. Reicha

Research output: Contribution to journalArticle

3 Citations (Scopus)


The very early stages of SiOx film formation were studied on NaCl (100) surfaces by evaporating SiO. The selective nucleation of SiOx on the surface defects resulted in decoration patterns by developing three-dimensional SiOx grains. The experiments were extended to get information both on the morphological peculiarities of SiOx grains and on the activated condensation of Au on a NaCl surface covered by a thin SiOx film.

Original languageEnglish
Pages (from-to)97-99
Number of pages3
Issue number1-2
Publication statusPublished - 1987


ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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