Structure and growth morphology of SiOx films deposited on NaCl (001) faces

M. El Hiti, P. Barna, F. M. Reicha

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The very early stages of SiOx film formation were studied on NaCl (100) surfaces by evaporating SiO. The selective nucleation of SiOx on the surface defects resulted in decoration patterns by developing three-dimensional SiOx grains. The experiments were extended to get information both on the morphological peculiarities of SiOx grains and on the activated condensation of Au on a NaCl surface covered by a thin SiOx film.

Original languageEnglish
Pages (from-to)97-99
Number of pages3
JournalVacuum
Volume37
Issue number1-2
DOIs
Publication statusPublished - 1987

Fingerprint

Surface defects
surface defects
Condensation
Nucleation
condensation
nucleation
Thin films
thin films
Experiments

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Structure and growth morphology of SiOx films deposited on NaCl (001) faces. / El Hiti, M.; Barna, P.; Reicha, F. M.

In: Vacuum, Vol. 37, No. 1-2, 1987, p. 97-99.

Research output: Contribution to journalArticle

El Hiti, M. ; Barna, P. ; Reicha, F. M. / Structure and growth morphology of SiOx films deposited on NaCl (001) faces. In: Vacuum. 1987 ; Vol. 37, No. 1-2. pp. 97-99.
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