Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering

Matthias Krause, Laurent Bedel, Anthony Taupeau, Ulrich Kreissig, Frans Munnik, Gintautas Abrasonis, Andreas Kolitsch, György Radnoczi, Zsolt Czigány, Annick Vanhulsel

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13 Citations (Scopus)

Abstract

BCxNy thin films deposited at 250 °C by pulsed reactive magnetron sputtering of a B4C target in an Ar/N2 plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6% to 100% N2 in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp2 carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N2 concentration in the plasma and have significant influence on the Young′s modulus and the elastic recovery of the BCxNy thin films.

Original languageEnglish
Pages (from-to)77-83
Number of pages7
JournalThin Solid Films
Volume518
Issue number1
DOIs
Publication statusPublished - Nov 2 2009

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Keywords

  • BCN
  • Hard coatings
  • Magnetron sputtering
  • Mechanical properties
  • Spectroscopy
  • Structural properties
  • Thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Krause, M., Bedel, L., Taupeau, A., Kreissig, U., Munnik, F., Abrasonis, G., Kolitsch, A., Radnoczi, G., Czigány, Z., & Vanhulsel, A. (2009). Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering. Thin Solid Films, 518(1), 77-83. https://doi.org/10.1016/j.tsf.2009.06.030