Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001)

Tatsuya Ohbuchi, Masaki Ishino, Kenji Makihara, Hong Qiu, Mituru Hashimoto, A. Barna, P. Barna

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Ni-Co alloy films 180-nm thick were deposited on MgO(001) substrates at 280°C by dc plasma-sputtering at 2.5 kV in pure Ar gas using a Ni90Co10 target. A bias voltage, Vs, of 0, - 110, - 140 or - 180 V was applied to the substrate during deposition. The structural and electrical properties of the films were studied as a function of Vs by X-ray photon electron spectroscopy, cross-section transmission electron microscopy and by measurements of the temperature coefficient of electrical resistance (TCR), η, from 150 to 300 K as well as resistivity, ρr, at 10 K. The composition inside the film is uniformly Ni87Co13 with no detectable impurity independently of Vs. The films retain normally the fcc structure epitaxially grown with the NiCo(001)∥MgO(001) and NiCo[010]∥Mg0[010] relationship. Misfit dislocations are induced at the interface to relax the strain energy due to the lattice mismatch between Ni87Co13 and MgO. In addition, the crystal lattice of the film near the interface is expanded. η increases and ρr decreases by applying Vs, suggesting that the application of Vs could improve the crystallinity of the films.

Original languageEnglish
Pages (from-to)32-36
Number of pages5
JournalThin Solid Films
Volume312
Issue number1-2
Publication statusPublished - Jan 14 1998

Fingerprint

Structural properties
Electric properties
electrical properties
Plasmas
Lattice mismatch
Acoustic impedance
Electron spectroscopy
Substrates
Bias voltage
Strain energy
electrical resistance
Dislocations (crystals)
crystal lattices
Crystal lattices
Sputtering
electron spectroscopy
crystallinity
Photons
Gases
sputtering

Keywords

  • Epitaxy
  • Interfaces
  • Sputtering
  • Transmission electron microscopy (TEM)

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001). / Ohbuchi, Tatsuya; Ishino, Masaki; Makihara, Kenji; Qiu, Hong; Hashimoto, Mituru; Barna, A.; Barna, P.

In: Thin Solid Films, Vol. 312, No. 1-2, 14.01.1998, p. 32-36.

Research output: Contribution to journalArticle

Ohbuchi, T, Ishino, M, Makihara, K, Qiu, H, Hashimoto, M, Barna, A & Barna, P 1998, 'Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001)', Thin Solid Films, vol. 312, no. 1-2, pp. 32-36.
Ohbuchi T, Ishino M, Makihara K, Qiu H, Hashimoto M, Barna A et al. Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001). Thin Solid Films. 1998 Jan 14;312(1-2):32-36.
Ohbuchi, Tatsuya ; Ishino, Masaki ; Makihara, Kenji ; Qiu, Hong ; Hashimoto, Mituru ; Barna, A. ; Barna, P. / Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001). In: Thin Solid Films. 1998 ; Vol. 312, No. 1-2. pp. 32-36.
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