Striations in dual-frequency capacitively coupled CF4 plasmas: The role of the high-frequency voltage amplitude

Yong Xin Liu, Z. Donkó, I. Korolov, Edmund Schüngel, You Nian Wang, Julian Schulze

Research output: Contribution to journalArticle

Abstract

Striations in dual-frequency (DF, 8/40 MHz) capacitively coupled CF4 plasmas have been investigated by phase resolved optical emission spectroscopy and via Particle-in-Cell/Monte Carlo collision simulations. The properties of striated structures of various plasma parameters in a DF discharge and the effect of the high-frequency voltage amplitude, φ H, on the striated structures and charged species densities were studied at a gas pressure of 100 Pa. The measured spatiotemporal electronic excitation rates at different φ H are in good agreement with the simulation results. It was found that the excitation/ionization patterns are modulated not only in space, but also in time by two frequencies. As φ H increases, the width of a single ion density peak, d peak, generally increases, leading to a decrease of the number of striations and finally to the disappearance of striations at higher φ H. d peak is believed to be determined by a local balance between the generation (via electron-impact ionization and dissociative attachment) and losses (primarily via recombination of the positive and negative ions, and detachment) of ions. We observed a hysteresis of the axial profiles of the measured plasma emission intensity and the simulated electron-impact excitation rate induced by increasing and decreasing φ H semi-continuously. The dependence of d peak on φ H was found to play a key role in the appearance of the hysteresis.

Original languageEnglish
Article number075005
JournalPlasma Sources Science and Technology
Volume28
Issue number7
DOIs
Publication statusPublished - Jul 25 2019

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Keywords

  • capacitively coupled RF discharge
  • electronegative plasma
  • low pressure
  • striations

ASJC Scopus subject areas

  • Condensed Matter Physics

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